IPA VAPOR DRYER / Particle Neutral Spot Free Drying

In-line Kimmon IPA vapor dryer demonstrated excellent process performance for IPA vapor condensation dryer that is stand-alone or fully integrated to a rinsing and chemical process wet station. The integrated technology meets the requirements of advanced processes such as ultrathin gate dielectric surface preparation, processes incorporating a wet etchback through a photoresist mask, and water spot free processing of devices with high-aspect-ratio features. Particle and water spot data from several fab sites, including a start-up fabs confirming that the Kimmon technology meets the ITRS goals for 130-nm and sub-130-nm processing