MARANGONI STYLE AMBIENT RINSE + IPA DRYERS

Model: NEO-2000-RD gen.1.5

 Your dream of flawless surface free from watermarks and particles. Advanced Processing Equipment Technology has been preparing for the 300mm under 0.090 technology’s surface to be even more perfect. The most adequate usage of Le Chatellier’s principle during the rinsing and drying procedure enables the finest control of wafer surface as no system could have done before.